Course Information
Course Aims
This course aims to provide a comprehensive introduction to the fabrication technologies of micro- and nano-structured electronic devices. The fabrication techniques discussed in the course are relevant for micro- and nano-devices in the fields of semiconductor, magnetics, optoelectronics, micro- and nano-electro-mechanical systems (MEMS/NEMS), and biomedical applications. The course covers essential topics including principles, fabrication and applications. The working principles of each fabrication technique are explained in detail, and the combination of these techniques into a complete process flow for making different microdevices is discussed.
The course also aims to familiarise students with the semiconductor processing techniques employed in the advanced manufacturing industry, so that they acquire direct applied knowledge before embarking on an engineering career in the semiconductor industry.
Intended Learning Outcomes (ILOs)
Upon successful completion of this course, students should be able to:
| ILO | Learning Outcome |
|---|---|
| ILO 1 | Identify and describe the basic building blocks of semiconductor devices. |
| ILO 2 | Present a general view of the trend of semiconductor technology development and its technological ecosystem. |
| ILO 3 | Explain the importance of contamination control and apply the relevant approach in semiconductor processing. |
| ILO 4 | Describe the techniques of optical lithography, resolution enhancement, and the working mechanism of photoresist. |
| ILO 5 | Identify the properties of non-optical lithography techniques, and apply the lithography process in building microfluidic devices. |
| ILO 6 | Describe wet and dry etching and apply the process conditions to achieve the lithography minimum feature size. |
| ILO 7 | Explain the physics of doping and apply the diffusion or ion implantation conditions. |
| ILO 8 | Design the doping concentration in bulk silicon wafer growth. |
| ILO 9 | Explain vacuum technology and design a desired vacuum condition by selecting suitable pumps and gauges. |
| ILO 10 | Describe metallic and dielectric film deposition processes and apply suitable tools to grow films. |
| ILO 11 | Use appropriate metallic layers for the interconnect metallisation process. |
| ILO 12 | Design probing configurations for device electrical measurement techniques. |
| ILO 13 | Describe the device packaging process and apply a suitable model for manufacturing yield calculation. |
| ILO 14 | Design an integrated process to complete CMOS transistor fabrication. |
| ILO 15 | Search relevant references and review technical topics. |
| ILO 16 | Write technical review reports and give a technical presentation on the surveyed topics. |
Course Content
| Lecture | Topic |
|---|---|
| Lecture 1 | Semiconductor Technology and Devices |
| Lecture 2 | Lithography |
| Lecture 3 | Etching and Pattern Transfer |
| Lecture 4 | Impurity Doping |
| Lecture 5 | Semiconductor Wafer and Thermal Oxidation |
| Lecture 6 | Vacuum Science and Technology |
| Lecture 7 | Film Deposition Techniques |
| Lecture 8 | Interconnections and Contacts |
| Lecture 9 | Device Packaging and Yield Models |
| Lecture 10 | Device Fabrication |
Planned Schedule
All sessions are delivered in person.
| Week | Topics | ILO | Readings | Activities |
|---|---|---|---|---|
| 1 | Course Introduction; Lecture 1 (Semiconductor Technology and Devices) | ILO 1-2 | Lecture note 1 | |
| 2 | Lectures 1 and 2 (Lithography) | ILO 2-3 | Lecture notes 1 and 2 | |
| 3 | Lecture 2 | ILO 4 | Lecture note 2 | |
| 4 | Lectures 2 and 3 (Etching and Pattern Transfer) | ILO 5-6 | Lecture notes 2 and 3 | Lab Demo |
| 5 | Lectures 3 and 4 (Impurity Doping) | ILO 6-7 | Lecture notes 3 and 4 | Lab Demo |
| 6 | Lectures 4 and 5 (Semiconductor Wafer and Thermal Oxidation) | ILO 7-8 | Lecture notes 4 and 5 | Lab Demo |
| 7 | Lecture 5; Midterm Test 1 | ILO 8 | Lecture note 5 | Test 1 |
| 8 | Lecture 6 (Vacuum Science and Technology) | ILO 9 | Lecture note 6 | Lab Demo |
| 9 | Lecture 7 (Film Deposition Techniques) | ILO 10-11 | Lecture note 7 | |
| 10 | Lectures 7 and 8 (Interconnections and Contacts) | ILO 10-12 | Lecture notes 7 and 8 | |
| 11 | Lectures 8 and 9 (Device Packaging and Yield Models) | ILO 12-14 | Lecture notes 8 and 9 | |
| 12 | Lecture 9; Midterm Test 2 | ILO 14 | Lecture note 9 | Test 2 |
| 13 | Lecture 10 (Device Fabrication); Assignment Presentations | ILO 15-16 | Lecture note 10 | Presentation |
Learning and Teaching Approach
| Approach | How It Supports the Learning Outcomes |
|---|---|
| Lectures | Students are first motivated with the relevant technology and processing techniques of electronic devices, followed by lectures that explain the working principles and physics. Wrap-up questions are provided. |
| Tutorials | Discussion of tutorial questions helps to consolidate understanding of the main concepts learned in lectures. |
| Lab Demonstrations | Held at the SPMS/PAP Microfabrication Cleanroom Laboratory, giving students first-hand experience of device microfabrication processes. Techniques such as photolithography, physical vapour deposition and etching are demonstrated, and students are encouraged to ask questions so that the field experience reinforces the lectures. |
| Technology-enhanced Learning | Extended learning is facilitated by online materials, including recorded lectures and videos of fabrication techniques and processes. |
Assessment
| Assessment Component | Coverage | Weightage | Format |
|---|---|---|---|
| Final Examination | All lectures | 50% | Restricted open book, individual |
| CA1: Assignment | Literature survey | 20% | Report + Presentation |
| CA2: Midterm Test 1 | Typically Lectures 1-5 | 15% | Restricted open book, individual |
| CA3: Midterm Test 2 | Typically Lectures 6-10 | 15% | Restricted open book, individual |
Assignment (CA1)
- Conduct a literature survey on a topic relevant to micro- and nano-fabrication, or micro- and nano-electronic devices, chosen from a list of topics provided. A self-proposed topic relevant to the course objectives is also allowed.
- Report length: 3,500 to 20,000 words.
- Students may work in pairs on the same topic; however, each student must submit an individual report, and reports within a pair cannot be identical.
- After report submission, each student gives a 20-minute oral presentation. A joint presentation by a pair is allowed, with 30 minutes given.
- The report is assessed on: quality of write-up; structure and organisation; quality of information gathering and references; presentation and discussion of surveyed information; and logical analysis and conclusion.
- The presentation is assessed on: quality of work presented; ability to give technical explanations; quality of presentation materials; clarity, language use and accuracy; and questions and answers.
Formative Feedback
- Feedback through discussion within tutorial lessons.
- Written and/or oral feedback on the assignment report and presentation.
- Feedback after each term test on common mistakes and the level of difficulty of the problems.
- Past examination questions and previous examiner's reports are discussed in lectures.
Reference Books
2. M. J. Madou, Fundamentals of Microfabrication and Nanotechnology, Vol. II: Manufacturing Techniques for Microfabrication and Nanotechnology, 3rd ed., CRC Press (2011). ISBN 978-1420055191.
3. S. M. Sze and M.-K. Lee, Semiconductor Devices: Physics and Technology, 3rd ed., Wiley (2012). ISBN 978-0470537947.
4. S. Franssila, Introduction to Microfabrication, 2nd ed., Wiley (2010). ISBN 978-0470749838.
These are the foundational readings for the course. More up-to-date readings will be provided when available.
Course Policies
Academic Integrity. Students are expected to uphold the NTU Honour Code and avoid all forms of academic dishonesty, including plagiarism, academic fraud, collusion and cheating. On the use of technological tools such as Generative AI, refer to the specific assignment instructions or consult the instructor.
Attendance. Students are encouraged to attend from the start of the course. Although lectures are recorded, lab demonstrations offer first-hand experience of the systems and equipment discussed in lectures, and later lectures build on earlier content.
Absence. If you are unable to attend a class (particularly a midterm test) due to illness, email the instructor and submit the original medical certificate, issued in Singapore by a registered medical practitioner, to the administrator. A make-up test is conducted only for students absent from both midterm tests with valid reasons.
Diversity and Inclusion. The course aims to provide an inclusive and collaborative learning environment. If your learning is being affected by any circumstance, please speak to the teaching team or the school pastoral officer. All members of the class are expected to respect one another and adhere to the NTU anti-harassment policy.