AJA 8–Target UHV MRAM Magnetron Sputtering System
Ultra-high vacuum magnetron deposition system optimized for MRAM and spintronic thin-film stacks.
ULVAC ENTRON-EX Sputtering System
High-throughput semiconductor deposition for metal interconnects, patterning masks, electrodes, and functional films.
Atomic Layer Deposition Tool
Atomic-scale precision deposition for ultra-thin dielectrics, passivation, and barrier layers with total conformality.
Raith e-Line Electron Beam Lithography
High-resolution pattern generator for ultra-fine nanoscale device patterning and prototype fabrication.
Raith Voyager Electron Beam Lithography
High-speed, scalable e-beam lithography engineered for spintronic devices, photonics, and sub-10 nm structures.
Suss Microtec MJB4 Mask Aligner
Precision optical alignment lithography tool for micro-scale contact printing and multi-level mask patterning.
AJA Ion Milling System with Hiden SIMS Detector
Argon ion beam milling equipped with inline secondary ion mass spectrometry for endpoint detection in magnetic stacks.
Plasma Therm 200 mm Dual Chamber ICP-RIE and PECVD System
Dual-chamber tool supporting Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) and Plasma-Enhanced Chemical Vapor Deposition (PECVD).
Cascade Microtech 40GHz RF Probe Station
High-frequency microwave probe station combined with magnetic field application setups for high-speed device dynamics.
Keithley 4200A-SCS Semiconductor Parameter Analyzer
Comprehensive I-V, C-V, and ultra-fast pulsed characterization analyzer for memristive, spintronic, and neuromorphic devices.
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